Ultra-Clean Technology Handbook

Ultra-Clean Technology Handbook

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Evaluating the effectiveness of conventional wet processes for cleaning silicon wafers in semiconductor production, this reference reveals concrete measures to improve ultrapure water quality reviewing the structure and physical characteristics of ultrapure water molecules. The volume is divided int... on the silicon wafer surface in the cleaning and drying steps of ultra-large- scale integrated (ULSI) circuit production. ... 1 /im design-ruled ULSI devices, the total impurity concentration in ultrapure water must be suppressed to below 2 ppt.

Title:Ultra-Clean Technology Handbook
Author: Ohmi
Publisher:CRC Press - 1993-06-29

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